Bruce Smith

2010 Submissions

Published Article

Xie, P., and B.W. Smith. “Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging.” Journal of Vacuum Science and Technology B, 28.6 (2010): C6Q12-C6Q19. Print. †≠*

Telecky, A., P. Xie, J. Stowers, A. Grenville, and B. W. Smith. “Photo-patternable inorganic hardmask.” Journal of Vacuum Science and Technology B, 28.6 (2010): C6S19-C6S22. Print.†≠*

Baylav, B., M. Zhao, R. Yin, P. Xie, C. Scholz, P. Zimmerman, and B.W. Smith. “Alternatives to Chemical Amplification for 193 nm Lithography.” Proceedings of the SPIE - The International Society for Optical Engineering, 7639 (2010): 1-5. Print. †≠*

Chen, L., Y. Goh, K. Lawrie, B.W. Smith, W. Montgomery, P.A. Zimmerman, I. Blakey, and A.K. Whittaker. “Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance.” Proceedings of the SPIE - The International Society for OpticalEngineering, 7639 (2010): 1-5. Print. ≠

Estroff, A., N.V. Lafferty, P. Xie, and B.W. Smith. “Metamaterials for enhancement of DUV lithography.” Proceedings of the SPIE - The International Society for Optical Engineering, 7640 (2010): 1-5. Print. †≠

Xie, P., N.V. Lafferty, and B.W. Smith. “Achieving Interferometric Double Patterning through Wafer Rotation.” Proceedings of the SPIE - The International Society for Optical Engineering, 7640 (2010): 76401Z-1-5. Print. †≠

Trikeriotis, M., Woo Jin Bae, E. Schwartz, M. Krysak, N. Lafferty, Peng Xie, B.W. Smith, P. Zimmerman, C.K. Ober, E.P. Giannelis. “Development of an inorganic photoresist for DUV, EUV, and electron beam imaging.” Proceedings of the SPIE - The International Society for Optical Engineering, 7639 (2010): 76390E-76390E-10. Print. †≠