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Scholarly Works

Bruce Smith

2013 Submissions

Journal Paper

Baylav, Burak, et al. "Impact of Pupil Plane Filtering on Mask Roughness Transfer." Journal of Vacuum Science & Technology B 31. 6 (2013): 06f801. Print. *

Fenger, Germain L, et al. "Extreme Ultraviolet Lithography Resist-based Aberration Metrology." Journal of Micro/Nanolithography, MEMS, and MOEMS 12. 4 (2013): 43001. Print. *

Sears, Monica Kempsell, Joost Bekaert, and Bruce W Smith. "Lens Wavefront Compensation for 3D Photomask Effects in Subwavelength Optical Lithography." Applied optics 52. 3 (2013): 314.322. Print. *

Sears, Monica Kempsell and Bruce W. Smith. "Modeling the Effects of Pupil-manipulated Spherical Aberration in Optical Nanolithography." Journal of Micro/Nanolithography, MEMS, and MOEMS 12. 1 (2013): 13008. Print. *

Xie, Peng and Bruce W Smith. "Scanning Interference Evanescent Wave Lithography for Sub-22-nm Generations." Journal of Micro/Nanolithography, MEMS, and MOEMS 12. 1 (2013): 13011. Print. *

Book Chapter

Smith, Bruce W. "Ch.1. Optical Projection Lithography." Nanolithography: The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems. Cambridge, UK: Woodhead Publishing Ltd., 2913. 10-85. Print.

Published Conference Proceedings

Baylav, Burak, et al. "Line Edge Roughness (LER) Mitigation Studies Specific to Interference-like Lithography." Proceedings of the SPIE Advanced Lithography. Ed. M. Dusa. San Jose, CA: SPIE Press, 2013. Print. £

Sears, Monica Kempsell and Bruce W Smith. "Pupil Wavefront Manipulation to Compensate for Mask Topography Effects in Optical Nanolithography." Proceedings of the SPIE Advanced Lithography. Ed. M. Dusa. San Jose, CA: SPIE Press, 2013. Print. £

Fenger, Germain L, et al. "EUVL Resist-based Aberration Metrology." Proceedings of the SPIE Advanced Lithography. Ed. O. Wood. San Jose, CA: SPIE Press, 2013. Print. £

Judged National/International Competition Award Winner

Smith, Bruce W. Optical Society of America. OSA Fellow. Washington, DC, 2013. *

Invited Presentations/Keynotes

Smith, Bruce W. "Lithography Beyond the IC." IMEC Technical Seminar Series. IMEC. Leuven, Belgium. 15 Oct. 2013. Guest Lecture. ∆

2012 Submissions

Journal Paper

Chen, Lan, et al. "Aqueous Developable Dual Switching Photoresists for Nanolithography." Journal of Polymer Science Part A: Polymer Chemistry 50. 20 (2012): 4255-4265. Print. *

Estroff, Andrew and Bruce W Smith. "Tuning Metamaterials for Applications at DUV Wavelengths." International Journal of Optics 2012. 603083 (2012): 1-7. Web. *

Chen, Lan, et al. "Synthesis and Characterization of Well-Defined Optically Active Methacrylic Diblock Copolymers." Journal of Polymer Science Part A: Polymer Chemistry 50. 1 (2012): 3923-4154. Print. *

Published Conference Proceedings

Smith, Bruce W. "The Saga of Lambda: Spectral Influences Throughout Lithography Generations." Proceedings of the SPIE Advanced Lithography. Ed. W. Conley. San Jose, CA: International Society for Optics and Photonics, 2012. Print. £

Maloney, Christopher W and Bruce W. Smith. "Longer Wavelength EUV Lithography (LW-EUVL)." Proceedings of the SPIE Advanced Lithography. Ed. O. Wood. San Jose, CA: SPIE International Society for Optics and Photonics, 2012. Print. £

Mailfert, Julien, Eric Hendrickx, and Bruce Smith. "3D Mask Modeling for EUV Lithography." Proceedings of the SPIE Advanced Lithography. Ed. O. Wood. San Jose, CA: International Society for Optics and Photonics, 2012. Print. £

Sears, Monica Kempsell, Joost Bekaert, and Bruce W Smith. "Pupil Wavefront Manipulation for Optical Nanolithography." Proceedings of the SPIE Advanced Lithography. Ed. W. Conley. San Jose, CA: International Society for Optics and Photonics, 2012. Print. £

2010 Submissions

Published Article

Xie, P., and B.W. Smith. “Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging.” Journal of Vacuum Science and Technology B, 28.6 (2010): C6Q12-C6Q19. Print. †≠*

Telecky, A., P. Xie, J. Stowers, A. Grenville, and B. W. Smith. “Photo-patternable inorganic hardmask.” Journal of Vacuum Science and Technology B, 28.6 (2010): C6S19-C6S22. Print.†≠*

Baylav, B., M. Zhao, R. Yin, P. Xie, C. Scholz, P. Zimmerman, and B.W. Smith. “Alternatives to Chemical Amplification for 193 nm Lithography.” Proceedings of the SPIE - The International Society for Optical Engineering, 7639 (2010): 1-5. Print. †≠*

Chen, L., Y. Goh, K. Lawrie, B.W. Smith, W. Montgomery, P.A. Zimmerman, I. Blakey, and A.K. Whittaker. “Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance.” Proceedings of the SPIE - The International Society for OpticalEngineering, 7639 (2010): 1-5. Print. ≠

Estroff, A., N.V. Lafferty, P. Xie, and B.W. Smith. “Metamaterials for enhancement of DUV lithography.” Proceedings of the SPIE - The International Society for Optical Engineering, 7640 (2010): 1-5. Print. †≠

Xie, P., N.V. Lafferty, and B.W. Smith. “Achieving Interferometric Double Patterning through Wafer Rotation.” Proceedings of the SPIE - The International Society for Optical Engineering, 7640 (2010): 76401Z-1-5. Print. †≠

Trikeriotis, M., Woo Jin Bae, E. Schwartz, M. Krysak, N. Lafferty, Peng Xie, B.W. Smith, P. Zimmerman, C.K. Ober, E.P. Giannelis. “Development of an inorganic photoresist for DUV, EUV, and electron beam imaging.” Proceedings of the SPIE - The International Society for Optical Engineering, 7639 (2010): 76390E-76390E-10. Print. †≠