|EUV Flare and Proximity Modeling and Model-based Correction||Longer Wavelength EUV Lithography (LW-EUVL)|
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C. Zugina, J. Word, R. Chalasani, M. Lam, M. Habib, G. F. Lorusso, E. Hendrickx, B. Baylav, "EUV flare and proximity modeling and model-based correction" Proc. SPIE 7969, (2011) paper
Copyright 2007 Society of Photo-Optical
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