RIT Center for Nanolithography Research

Immersion Lithography

Solid Immersion and Evanescent Wave Lithography at Numerical Apertures > 1.60 Three-Dimensional Imaging of 30-nm Nanospheres Using Immersion Interferometric Lithography Amphibian XIS: An Immersion Lithography Microstepper Platform
25nm Immersion Lithography at a 193nm Wavelength Immersion Lithography with Numerical Apertures above 2.0 using High Index Optical Materials Snell or Fresnel

B. W. Smith, J. Zhou, "Snell or Fresnel – The influence of material index on hyper NA lithography" Proc. SPIE 6520, (2007) paper

J. Zhou, N. Lafferty, B. W. Smith, J. H. Burnett, "Immersion Lithography with Numerical Apertures above 2.0 using High Index Optical Materials", Proc. SPIE 6520, (2007) paper

J. Zhou, Y. Fan, B. W. Smith, "Three-Dimensional Imaging of 30-nm Nanospheres Using Immersion Interferometric Lithography", Proc SPIE 6154, (2006) paper

B. W. Smith, Y. Fan, J. Zhou, L. Zavyalova, M. Slocum, J. Park, A. Bourov, E. Piscani, N. Lafferty, A. Estroff, "Solid Immersion and Evanescent Wave Lithography at Numerical Apertures > 1.60", Immersion Lithography Symposium, Brugges ,(2005) paper

B. W. Smith, Y. Fan, M. Slocum, L. Zavyalova, "25nm Immersion Lithography at a 193nm Wavelength", Proc. SPIE 5754, (2005) paper

B. W. Smith, A. Bourov, Y. Fan, F. Cropanese, P. Hammond, "Amphibian XIS: An Immersion Lithography Microstepper Platform", Proc. SPIE 5754, (2005) paper

Y. Fan, A. Bourov, L. Zavyalova, J. Zhou, A. Estroff, N. Lafferty, B. W. Smith, "ILSim - A compact simulation tool for interferometric lithography", Proc. SPIE 5754, (2005) paper

J. Zhou, Y. Fan, A. Bourov, N. Lafferty, F. Cropanese L. Zavyalova,, A. Estroff, B. W. Smith, "Immersion lithography fluids for high NA 193 nm lithography", Proc. SPIE 5754, (2005) paper

J. Zhou, Y. Fan, A. Bourov, L. Zavyalova, B. W. Smith, "High refractive index liquid for 193nm immersion lithography", RIT Center for Nanolithography Research - Immersion fluids update, (2004) presentation

B. W. Smith, Y. Fan, J. Zhou, A. Bourov, , L. Zavyalova, E. Piscani, J. Park, D. Summers, K. Wolf, F. Cropanese, "High index aqueous immersion fluids for 193nm and 248nm lithography", RIT Center for Nanolithography Research - Immersion fluids update, (2004) presentation

B. W. Smith, A. Bourov, Y. Fan, L. Zavyalova, N. Lafferty, F. Cropanese, "Approaching the numerical aperture of water - immersion lithography at 193nm", Proc. SPIE 5377, (2004) paper | presentation

Y. Fan, N. Lafferty, A. Bourov, L. Zavyalova, B. W. Smith, "Study of Air Bubble Induced Light Scattering Effect On Image Quality in 193 nm Immersion Lithography", Proc. SPIE 5377, (2004) paper | presentation

A. Bourov, Y. Fan, F. Cropanese, N. Lafferty, L. Zavyalova, H. Kang, B. W. Smith, "Immersion microlithography at 193nm with a Talbot prism interferometer", Proc. SPIE 5377, (2004) paper | poster

B. W. Smith, H. Kang, A. Bourov, F. Cropanese, Y. Fan, "Water immersion optical lithography for the 45nm node", Proc. SPIE 5040, (2003) paper

Copyright 2007 Society of Photo-Optical Instrumentation Engineers.
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Aberration Metrology | Immersion Fluids Research | Optical Extensions and Image Theory | High NA and Polarization | Thin Films Research | EUV
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