RIT Center for Nanolithography Research

Composite Films Modeling

Atomistic modelling allows for simulation of various composites based on the materials we have characterized. An effective media approximation is used, which assumes structural dimension (grain size, layer thickness, etc.) is less than 0.1 of minimum wavelength considered. For materials with similar optical properties, ratios determine the properties of the composite. For the materials that differ widely, structure may impact actual performance. Materials marked with r are sputtered using a reactive process, marked n are sputtered from a stoichiometric target.

Fill out the form below to create a composite film.

Material 1 (Host):   % Material 1: 
Material 2:  % Material 2: 
Material 3:  % Material 3: 
Depolarization factor q: 
Substrate:  Media: 
Wavelength of Interest: 
Thickness (for Thin Film application only): nm
©1996-2010 Center for Nanolithography Research, Rochester Institute of Technology