Professor Bruce Smith has been a member of the engineering faculty at RIT since joining the Microelectronic Engineering program in 1988. He is currently the Director of the Microsystems Engineering Ph.D. program and an extended faculty member with the Center for Imaging Science and the Center for Materials Science and Engineering. He received B.S., M.S. and Ph.D. degrees in Imaging Science from RIT, concentrating on thin films, materials, and semiconductor lithography. Prior to joining the RIT faculty, he held R&D positions in semiconductor engineering at Digital Equipment Corporation in Hudson, MA and AMI Semiconductor in San Jose, CA. Professor Smith and his group in the Nanolithography Research Laboratory carry out research in areas of micro- and nano-fabrication including nanolithography, semiconductor processing, thin film materials, and optical engineering. Their work is directed toward leading edge electronic, photonic, micromechanical, and display devices and structures. Professor Smith is a Fellow of the IEEE, a Fellow of the OSA, a Fellow of SPIE, and a member of AVS and ASEE.
Professor Smith has received numerous research grants from federal agencies, research consortia, and industrial groups, totaling several million dollars. He has published over 200 papers, presented over 50 keynote, plenary, or invited talks, authored several book chapters, and his textbook “Microlithography: Science and Technology” has become widely used worldwide for academics and professionals. His publications have been cited over 2500 times and he has a citation h-index of 25. Professor Smith holds over 30 patents in areas including illumination systems, masking devices, optical system design, and semiconductor materials engineering, several of which have been licensed for commercialization. Dr. Smith has been a key contributor in the development and adoption of excimer laser water immersion nanolithography, leading research efforts in the dominant technology for current semiconductor device manufacturing.
Professor Smith has been a pioneer in his field, leading to world-wide recognition of his accomplishments and those of his students. Over the years, Professor Smith has developed first-of-a-kind courses in semiconductor lithography, materials, and processing that have been used as the basis for classes at universities worldwide. Additionally, he has pioneered unique engineering research experiences for both graduate and undergraduate students. Through support from Mentor Graphics Corp. and IMEC (Interuniversity Microelectronics Centre) he created the RIT/IMEC/Mentor Graphics Graduate Research Experience for extended student assignments with researchers at the IMEC consortium in Belgium. The program has supported Ph.D. students from RIT and elsewhere for over ten years. Through the US Department of Education, he established a Graduate Assistance in Areas of National Needs (GAANN) program for Ph.D. Study in Microsystems Engineering at RIT. He has also created collaborative research internships at SEMATECH, Intel, and GLOBALFOUNDRIES. Among numerous grants from federal agencies, research consortia, and industrial groups, he has had over 15 years of continuous support through funding from the Semiconductor Research Corporation (SRC) for graduate research in semiconductor IC nanolithography. Support through SRC has enabled student involvement with researchers from top IC companies from around the world.
Additional information about Dr. Smith and the Nanolithography Research Laboratory can be found at www.rit.edu/lithography.
HONORS AND AWARDS
2015 Fellow, Institute of Electrical and Electronics Engineers (IEEE)
2014 IEEE Technology Innovation Award
2014 RIT College of Engineering Research and Publication Award
2013 RIT Innovation Hall of Fame
2012 Fellow, Optical Society of America (OSA)
2011 SPIE Research Mentor Award
2008 Visiting Professor, IMEC Micro and Nanoelectronics Research Center
2007 Trustees Excellence in Scholarship and Teaching Award, Rochester Institute of Technology
2007 Fellow, International Society for Optical Engineering (SPIE)
2007 Rush Henrietta Outstanding Alumni Award
2005 Million Dollar Principle Investigator Award, Rochester Institute of Technology
2005 Patenting Productivity Award, Rochester Institute of Technology
2002 Intellectual Property Productivity Award, Rochester Institute of Technology
2001 Visiting Professor, IMEC Micro and Nanoelectronics Research Center
2000 Intel Professor of Research and Technology, Intel Corp.
1999 RIT Creators Award, Rochester Institute of Technology
1997 Visiting Scholar, International SEMATECH
“The saga of sigma: influences of illumination throughout optical generations,” BW Smith - SPIE Advanced Lithography, 2014.
“Feasibility of compensating for EUV field edge effects through OPC,” C Maloney, J Word, GL Fenger, A Niroomand, BW Smith, SPIE Advanced Lithography, 2014.
“Optimization of image-based aberration metrology for EUV lithography,” Z Levinson, G Fenger, A Burbine, AR Schepis, BW Smith, SPIE Advanced Lithography, 2014.
“Study of angular effects for optical systems into the EUV,” A Burbine, Z Levinson, A Schepis, BW Smith, SPIE Advanced Lithography, 2014.
“Optical Projection Lithography,” B.W. Smith, Nanolithography: The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems, Woodhead Publishing, 2014.
"Extreme ultraviolet lithography resist-based aberration metrology," Germain L. Fenger; Lei Sun; Sudharshanan Raghunathan; Obert R. Wood; Bruce W. Smith, J. Micro/Nanolith. MEMS MOEMS. 12 (4), 2013.
“The Impact of Pupil Plane Filtering on Mask Roughness Transfer,” Burak Baylav, Chris Maloney, Zac Levinson, Joost Bekaert, Alessandro Vaglio Pret, and Bruce W. Smith, J. Vac. Sci. Technol. B 31, 06F801, 2013.
“Modeling the effects of pupil-manipulated spherical aberration in optical nanolithography”, M. K. Sears, B.W. Smith, J. Micro/Nanolith. MEMS MOEMS. 12(1), 2013.
“Scanning interference evanescent wave lithography for sub-22-nm generations,” P. Xie, B. W. Smith, J. Micro/Nanolithography, MEMS, and MOEMS. 12(1), 2013.
“Lens wavefront compensation for 3D photomask effects in subwavelength optical lithography,” M.K. Sears, J. Bekaert, B.W. Smith, Applied Optics 52 (3), 314-322, 2013.
“Line edge roughness (LER) mitigation studies specific to interference-like lithography,: B Baylav, A Estroff, P Xie, BW Smith, Proc. SPIE 8683, Optical Microlithography XXVI, 86831Y, 2013
“Pupil wavefront manipulation to compensate for mask topography effects in optical nanolithography,” MK Sears, BW Smith, Proc. SPIE 8683, Optical Microlithography XXVI, 86830G, 2013.
“EUVL resist-based aberration metrology,” Germain L. Fenger ; Sudharshanan Raghunathan ; Lei Sun ; Obert R. Wood ; Bruce W. Smith, Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790P, 2013.
“Tuning Metamaterials for Applications at DUV Wavelengths,” A. Estroff, B.W. Smith, Intl. Journal of Optics, 2012.
“Aqueous developable dual switching photoresists for nanolithography”, L. Chen, Y.K. Goh, H.H. Cheng, B.W. Smith, P. Xie, W. Montgomery, A.K. Whittaker, I. Blakey, Journal of Polymer Science Part A: Polymer Chemistry 1, 2012.
“The saga of lambda: spectral influences throughout lithography generations,” B.W. Smith, Proc. SPIE 8325, 2012.
“Pupil wavefront manipulation for optical nanolithography,” Monica Kempsell Sears, Joost Bekaert, and Bruce W. Smith, Proc. SPIE 8326, 2012.
“Longer wavelength EUV lithography (LW-EUVL),” Christopher W. Maloney and Bruce W. Smith, Proc. SPIE 8322, 2012.
“Scanning interference evanescent wave lithography for sub-22 nm generations,” Peng Xie and Bruce W. Smith, Proc. SPIE 8326, 2012.
“3D mask modeling for EUV lithography,” Julien Mailfert, Christian Zuniga, Vicky Philipsen, Konstantinos Adam, Michael Lam, James Word, Eric Hendrickx, Geert Vandenberghe, and Bruce Smith, Proc. SPIE 8322, 2012.
“Aqueous Developable Dual Switching Photoresists for Nanolithography,” Lan Chen, Yong Keng Goh, Han Hao Cheng, Bruce W. Smith, Peng Xie, Warren Montgomery, Andrew K. Whittaker, Idriss Blakey, Journal of Polymer Science Part A: Polymer Chemistry, 2012.
“Lithography beyond the IC”, B.W. Smith, Proc. SPIE, v 7973-01, 2011.
“PAG-free chain scissioning resists fro 193-nm immersion lithography that can be developed by aqueous base,” I. Blakey, L. Chen, Y. K. Goh, A. Dorgelo, P. Xie, N. Lafferty, B. Smith, P. Zimmerman, M.W. Montgomery, A. Whittaker, Proc. SPIE, v 7972-86, 2011.
“Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193-nm lithography,” M. Krysak, M. Trikeriotis, E. Schwarz, N. lafferty, P. Xie, B.W. Smith, P. Zimmerman, M.W. Montgomery, E. Giannelis, C. Ober, Proc. SPIE v 7972-48, 2011.
“Extending SMO into the pupil plane,” M. Kempsell Sears, B.W. Smith, Proc. SPIE v 7973-46, 2011.
“Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging,” P. Xie and B. W. Smith, J. Vac. Sci. Technol. B 28, 2010.
“Photo-patternable inorganic hardmask,” Alan Telecky, Peng Xie, Jason Stowers, Andrew Grenville, Bruce Smith, and Douglas A. Keszler, J. Vac. Sci. Technol. B 28, 2010.
“Alternatives to Chemical Amplification for 193 nm Lithography,” Baylav, B.; Meng Zhao; Ran Yin; Peng Xie; Scholz, C.; Smith, B.; Smith, T.; Zimmerman, P. Source: Proceedings of the SPIE - The International Society for Optical Engineering, v 7639, 2010.
“Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance,” Lan Chen; Yong-Keng Goh; Lawrie, K.; Smith, B.; Montgomery, W.; Zimmerman, P.A.; Blakey, I.; Whittaker, A.K., Proceedings of the SPIE - The International Society for Optical Engineering, v 7639, 2010
“Metamaterials for enhancement of DUV lithography,” Estroff, A.; Lafferty, N.V.; Peng Xie; Smith, B.W., Proceedings of the SPIE - The International Society for Optical Engineering, v 7640, 2010.
“Achieving Interferometric Double Patterning through Wafer Rotation,” Peng; Lafferty, N.V.; Smith, B.W., Proceedings of the SPIE - The International Society for Optical Engineering, v 7640, 2010.
“Development of an inorganic photoresist for DUV, EUV, and electron beam imaging,” Trikeriotis, M.; Woo Jin Bae; Schwartz, E.; Krysak, M.; Lafferty, N.; Peng Xie; Smith, B.; Zimmerman, P.; Ober, C.K.; Giannelis, E.P., Proceedings of the SPIE - The International Society for Optical Engineering, v 7639, 2010.
8,852,850 Method of photolithography using a fluid and a system thereof
7,768,648 Method for aberration evaluation in a projection system
7,345,735 Apparatus for aberration detection and measurement
7,233,887 Method of photomask correction and its optimization using localized frequency analysis
7,170,588 Reduction Smith-Talbot interferometer prism for micropatterning
7,136,143 Method for aberration detection and measurement
7,092,073 Method of illuminating a photomask using chevron illumination
6,934,010 Optical proximity correction method utilizing gray bars as sub-resolution assist features
6,881,523 Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features
6,846,595 Method of improving photomask geometry
6,835,505 Mask for projection photolithography at or below about 160 nm and a method thereof
6,791,667 Illumination device for projection system and method for fabricating
6,788,388 Illumination device for projection system and method for fabricating
6,556,361 Projection imaging system with a non-circular aperture and a method thereof
6,541,750 Modification of a projection imaging system with a non-circular aperture and a method thereof
6,525,806 Apparatus and method of image enhancement through spatial filtering
6,480,263 Apparatus and method for phase shift photomasking
6,466,304 Illumination device for projection system and method for fabricating
6,395,433 Photomask for projection lithography at or below about 160 nm and a method thereof
6,388,736 Imaging method using phase boundary masking with modified illumination
6,368,755 Masks for use in optical lithography below 180 nm
6,309,780 Attenuated phase shift mask and a method for making the mask
5,939,227 Multi-layered attenuated phase shift mask and a method for making the mask
JP2010079303 Method of improving photomask geometry
JP2006079117 Optical proximity correction method utilizing gray bar as sub-resolution assist feature
EP1240557 Imaging method using phase boundary masking with modified illumination