RIT Center for Nanolithography Research

Optical Extensions and Imaging Theory

Evanescent Wave Imaging Photoresist Modulation Curves Experimental Measurement of Photoresist Modulation Curves
Resist Process Window Characterization for the 45-nm Node Using an Interferometric Immersion Microstepper Effects of Beam Pointing Instability on Two-Beam Interferometric Lithography Mask Enhancement Using an Evanescent Wave Effect

N. Lafferty, J. Zhou, B. W. Smith, "Mask Enhancement Using and Evanescent Wave Effect", Proc. SPIE 6520,(2007) paper

A. Bourov, S. A. Robertson, B. W. Smith, M. A. Slocum, E. C. Piscani, "Experimental Measurement of Photoresist Modulation Curves", Proc. SPIE 6154, (2006) paper

A. Bourov, S. A. Robertson, B. W. Smith, M. A. Slocum, E. C. Piscani, "Resist Process Window Characterization for the 45-nm Node Using an Interferometric Immersion Microstepper", Proc. SPIE 6153, (2006) paper

Y. Fan, A. Bourov, M. Slocum, B. W. Smith, "Effects of Beam Pointing Instability on Two-Beam Interferometric Lithography", Proc. SPIE 6154, (2006) paper

B.W. Smith, Y. Fan, J. Zhou, N. Lafferty, A. Estroff, "Evanescent Wave Imaging in Optical Lithography", Proc. SPIE 6154, (2006) paper

A. Bourov, Y. Fan, F. C. Cropanese, B. W. Smith, "Photoresist Modulation Curves", Proc. SPIE 5754, (2005) paper

N. Lafferty, G. Vandenberghe, B.W. Smith, M. Lassiter, P. Martin, "Gray assist bar OPC", Proc. SPIE 5377, (2004) paper | presentation

F. Cropanese, A. Bourov, Y. Fan, A. Estroff, L. Zavyalova, B.W. Smith, "Synthesis of projection lithography for low k1 via interferometry", Proc. SPIE 5377, (2004) paper | poster

B.W. Smith, "Forbidden pitch or duty free: revealing the causes of across-pitch imaging differences", Proc. SPIE 5040, (2003) paper | presentation

B.W. Smith, G. Vandenberghe, "Image enhancement through square illumination shaping", Proc. SPIE 4691, (2002) paper

B.W. Smith, D. Ewbank, "OPC and image optimization using localized frequency analysis", Proc. SPIE 4691, (2002) paper

B.W. Smith, "Mutually optimizing resolution enhancement techniques: illumination, APSM, assist feature OPC, and gray bars", Proc. SPIE 4348, (2001) paper

Copyright 2007 Society of Photo-Optical Instrumentation Engineers.
These papers were (will be) published in Proceedings of SPIE, Microlithography and are made available as electronic reprints (preprints) with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

Aberration Metrology | Immersion Fluids Research |Immersion Lithography | High NA and Polarization | Thin Films Research

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