Optical thin films for UV/VUV
UV/VUV properties of various oxide, nitride, silicide, and intermetallic thin films and multilayer film stacks for application as attenuated phase shift mask (APSM) materials, optical AR's, resist ARCs, binary masks materials have been investigated. Thin films refractive index and extinction coefficient data was obtained by means of spectroscopic ellipsometry combined with spectrophotometry.Composite films for UV/VUV
Atomistic modelling allows for simulation of various composites based on the materials we have characterized. An effective media approximation is used, which assumes structural dimension (grain size, layer thickness, etc.) is less than 0.1 of minimum wavelength considered.Resist parameter Characterization
Several commercial resists have been optically characterized . Results of these studies include the n&k data, Cauchy coefficients, and the ABC parameters (Dill parameters). The extracted Cauchy coefficients are valid for use at wavelengths of 400 nm to 800 nm.Questions, Comments, Feedback?
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Zavyalova.