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Non-toxic Intaglio Printmaking Adv. Cert.

Program overview

This advanced certificate offers technical training and retraining for artists and printmaking professionals seeking a comprehensive working knowledge of non-toxic intaglio printmaking techniques, including a study of methodology and aesthetic applications.

Curriculum

Semester conversion
Effective fall 2013, RIT will convert its academic calendar from quarters to semesters. Each program and its associated courses have been sent to the New York State Department of Education for approval of the semester plan. For reference, the following charts illustrate the typical course sequence for this program in both quarters and semesters. Students should consult their academic advisers with questions regarding planning and course selection.

New program
Effective fall 2013, a new program in non-toxic printmaking will be offered and will take the place of the former program in non-toxic intaglio printmaking.

Non-toxic intaglio printmaking, advanced certificate, typical course sequence (quarters)

Course Qtr. Cr. Hrs.
2021-741 Non-Toxic Intaglio Printmaking I 4
2021-742 Non-Toxic Intaglio Printmaking II 4
2021-743 Non-Toxic Intaglio Printmaking II 4
Total Quarter Credit Hours
12

Non-toxic printmaking, advanced certificate, typical course sequence (semesters), effective fall 2013

Course Sem. Cr. Hrs.
First Year
FNAS-606 Non-Toxic Printmaking I  6
FNAS-606 Non-Toxic Printmaking II 6
Total Semester Credit Hours 12

Admission requirements

To be considered for admission to the advanced certificate in non-toxic intaglio printmaking, candidates must fulfill the following requirements:

  • Hold a BFA, MFA, or be recognized as a master printer or professional printmaker,
  • Submit official transcripts (in English) of all previously completed undergraduate and graduate course work,
  • Submit a letter of intent,
  • Submit a current resume,
  • Submit a slide portfolio (between 10–20 slides), 
  • Submit three references with contact information, and
  • Complete an application.