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Corning & Microsystems Engineering

Dr. Karl Hirschman and a team of graduate and co-op students, and staff members are partnering with Corning Incorporated to develop a key future technology using a new silicon-on-glass material for flat panel displays. The technology has been in development for over three years, with fabrication taking place in RIT's Semiconductor & Microsystems Fabrication Laboratory.

The partnership involves process development, thin-film transistor (TFT) fabrication, device modeling, and correlating the device's performance with the quality of the silicon-on-glass substrate. A Sponsored Research Agreement defines the Intellectual Property details, which may be solely owned by RIT or jointly owned with Corning Incorporated, and provides Corning Incorporated with full access and the opportunity to protect the developed technology.

"We are encouraged by the work we have seen in RIT's labs regarding the development of methods to make TFTs on Corning's silicon-on-glass backplane material. The collaboration between RIT and Corning is showing promise, and is adding to the potential commercialization efforts for Corning."

David L. Morse

Senior Vice President & Director of Corporate Research

Corning Incorporated