The lab houses the following equipment, listed by type, with specifications:
Basic Electron Microscopy:
• JEOL 6400V scanning electron microscope with a 200 kV LaB6 electron gun and energy dispersive X-ray analysis for elemental microanalysis
• JEOL 100CX II 100 kV transmission electron microscope
• TV cameras to aid focusing and provide in situ TEM capabilities
• Reichert Jung ultramicrotome for cross-section preparation
• Nikon 9000 film scanner for digitizing electron micrographs
The lab has access to advanced electron microscopes at the Cornell Center for Materials Research. These include:
• A FEI Tecnai F20 200 kV field emission transmission electron microscope with monochromator. Probe size: 1 Å in TEM and 1.4 Å in STEM. Equipped with a Gatan tridium spectrometer for electron energy loss spectroscopy spectra at high energy resolution <0.2 eV, optimized recording of energy filtered TEM elemental maps, EELS low-loss studies (e.g. band gap analysis), and chemical bonding information at nanometer resolution. The Tecnai is also able to do electron tomography, which produces 3-D structures from 2-D projections, by acquiring an image every 2 degrees at angles +/- 70 degrees. This is only possible using the NanoImaging Lab’s tomography holder and specialized software.
• The NION 100 kV UltraSTEM has a spherical aberration corrector integrated into its column, which nulls all axial aberrations up to fifth order. As a result, an angstrom-scale probe with 0.1 nA of current enables imaging with angstrom-level resolution. The electron optics can be quickly changed to produce a 2-3 angstrom probe with 1 nA or more of current for analytical purposes (electron energy loss spectroscopy).
For assistance or more information, please contact:
Richard Hailstone, Director
Phone: (585) 475-6306