An advanced course covering the physical aspects of micro- and nano-lithography. Image formation in projection and proximity systems are studied. Makes use of optical concepts as applied to lithographic systems. Fresnel diffraction Fraunhofer diffraction and Fourier optics are utilized to understand diffraction-limited imaging processes and optimization. Topics include illumination lens parameters image assessment resolution phase-shift masking and resist interactions as well as non-optical systems such as EUV maskless e-beam and nanoimprint. Lithographic systems are designed and optimized through use of modeling and simulation packages.
- Price $1,035 per credit hour (2017-18 AY)
3 credit hours
This 15 week course requires students to spend approximately 9 hours a week on course work.
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