Microlithography Materials and Processes covers the chemical aspects of microlithography and resist processes. Fundamentals of polymer technology will be addressed and the chemistry of various resist platforms including novolac styrene and acrylate systems will be covered. Double patterning materials will also be studied. Topics include the principles of photoresist materials including polymer synthesis photochemistry processing technologies and methods of process optimization. Also advanced lithographic techniques and materials including multi-layer techniques for BARC double patterning TARC and next generation materials and processes are applied to optical lithography.