This course introduces the beginning graduate student to the fabrication of solid-state devices and integrated circuits. The course presents an introduction to basic electronic components and devices, lay outs, unit processes common to all IC technologies such as substrate preparation, oxidation, diffusion and ion implantation. The course will focus on basic silicon processing. The students will be introduced to process modeling using a simulation tool such as SUPREM. The lab consists of conducting a basic metal gate PMOS process in the RIT clean room facility to fabricate and test a PMOS integrated circuit test ship. Laboratory work also provides an introduction to basic IC fabrication processes and safety.
3 credit hours
This 15 week course requires students to spend approximately 9 hours a week on course work.
- Prerequisites: Graduate standing in the MCEE-MS or Microelectronics Manufacturing Engineering (ME) program or permission of instructor.
Enrollment restrictions are subject to change. Please contact us for assistance.
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