RIT Center for Nanolithography Research

Optical Properties of Thin Films for DUV and VUV Microlithography

In order to meet material demands of nanotechnology, new classes of material combinations need exploration. We have investigated the UV and VUV optical properties of various metal, oxide, nitride, silicide, and intermetallic thin films and multilayer film stacks for optical and barrier layer applications. Our current efforts remain directed toward finding materials or material combinations whose optical and mechanical properties accommodate nanotechnology and short wavelength nanolithography applications.

Thin films refractive index and extinction coefficient data were obtained by means of spectroscopic ellipsometry combined with spectrophotometry.

Unless noted, all films have been rf magnetron sputtered at thickness of 1000 A or less. Bulk materials appear in italics.

VUV Data
Silicon Carbide, amorphous C, cubic Diamond
37% HCl
Nb2O5(r), Al2O3(r), Al2O3(n)
Mo, MoN, MoOx, Cr2O3, CrN, Nb, NbN, Zr, ZrN
Ti, TiN, TiO, Ta, TaN, Ta2O5, SiO2, Si3N4
Hf,   HfO2, HfF4
BaF2, GdF, LaF3, LiF, MgF2, SrF2, YF3, YbF3
UV/visible data
W, W, WO3, WN
Mo, MoN
Zr, ZrO2, ZrN, ZrF4,
Ta, Ta, Ta2O5, TaN, TaSi2
Cr, CrF3
Al, Al2O3, AlN, Ti
Hf, HfO2, HfF4
BaF2, GdF, LaF3, LiF, MgF2, SrF2, YF3, YbF3
Ag Au, Cu, Fe, Mn, Ni, Pd, Pt , Rh, V,
amorphous-Si, crystalline-Si, SiO2, Si3N4
Bulk substrates: soda lime, fused silica, CaF2, MgF2, LiF
Pellicle AR high, Pellicle fluoropolymer

Page last updated on April 26, 2012

©1996-2012 Center for Nanolithography Research, Rochester Institute of Technology