Welcome to the Nanolithography Research Labs at the Rochester Institute of Technology
Research presented here has been carried out by students in the College of Engineering and College of Science under the direction of Dr. Bruce W. Smith and with support from the Semiconductor Research Corporation (SRC), DARPA/AFRL, International SEMATECH, ASML, Finle KLA/Tencor, Exitech, Intel, IBM and others.
Recent Changes
We have recently migrated our site to a new server. This has allowed us to update the thin films section of the site to a better environment for the scripts that generate the refractive index data. We have also updated our group name to better reflect the policies of RIT. Also, ILSim has been updated to a version that is more MATLAB version independent.
We've also recently added two new utilities to our site, which give the possibility to run composite thin films and thin film refractive index scripts from a cellular phone.
Recent Papers
- On the Quality of Measured Optical Aberration Coefficients Using Phase Wheel Monitor
- Mask Enhancement Using an Evanescent Wave Effect
- Snell or Fresnel - The Influence of Material Index on Hyper NA Lithography
- Immersion Lithography with Numerical Apertures Above 2.0 Using High Index Optical Materials
From left to right: Peng Xie, Andrew Estroff, Jianming Zhou, Neal Lafferty, Bruce Smith, Bob Frankel, Lena Zavyalova, Anatoly Bourov, Meng Zhao
