Here are some articles featuring RIT and/or lithography topics that have been published.

Peng Xie wins Best Student Paper honors at SPIE Advanced Lithography 2012

SPIE Advanced Lithography Program

 

Andrew Estroff wins Best Student Paper honors at SPIE Advanced Lithography 2010

SPIE Advanced Lithography Program

Dr. Bruce W. Smith receives the 2007 RIT Trustees Scholarship award

RIT News and Events, May 2007

Neal Lafferty wins Best Student Paper honors at SPIE Advanced Lithography 2007

SPIE Advanced Lithography Program

Neal Lafferty wins Best Student Paper honors at SPIE Advanced Lithography 2007

RIT News & Events, April 2007

Prof. Bruce Smith elected 2007 SPIE Fellow for specific achievements in optical micro- and nanolithography

SPIE.org, February 2007

Fine Lines

RIT University Magazine, Winter 2006

In the Chips

RIT University Magazine, Winter 2006

Bruce Smith, alum

RIT University Magazine, Winter 2006

Breakthrough Lithography Method Developed at RIT

Physorg.com, February 2006

Immersion steals show at SPIE but challenges remain

EE Times, February 2005

RIT pushes 193-nm immersion lithography to 31-nm

EE Times, February 2005

RIT to describe solid immersion for 25-nm lithography

EE Times, February 2005

Microchip keeps head above water: How RIT Research Takes Lithography Field by Storm

The Reporter, April 2004

Submerging Silicon in water makes for faster chips

The Inquirer.net, April 2004

Smaller chips? Just add water

Infoworld, April 2004

Lithography experts hash out 193nm plans

Solid State Technology, March 2004

38-nm resolution immersion lithography demonstrated

OE Magazine, February 2004

Mix of talent propels immersion

EE Times, February 2004

RIT demos 38-nm resolutions with 193-nm immersion

Silicon Strategies, January 2004

'Doped water' could extend 193-nm immersion litho

EE Times, January 2004

Rochester Institute of Technology Researchers Develop Next-Generation Image-Resolution Technology; Bruce Smith to Demonstrate New Optical Microlithography Technique

NanoXchange, January 2004

SECTION 4 INTRODUCTION, VOL 15: Lithography, Equipment and Materials

Future Fab International, July 2003

SPIE Microlithography Report: LIL may bridge 157nm, EUV gap

Solid State Technology, May 2003