RIT Center for Nanolithography Research

High NA and Polarization

Hyper-NA and Polarization Mask Induced Polarization Effects at High NA

B. W. Smith, J. Zhou, P. Xie, "Applications of TM Polarized Illumination" Proc. SPIE 6924, (2008) paper

T. Brist, G. E. Bailey, A. Drozdov, A. Torres, A. Estroff, E. Hendrickx, "Source polarization and OPC effects on illumination optimization" Proc. SPIE 5992, (2005) paper

G. E. Bailey, K. Adam, T. Brist, O. Toublan, A. Estroff, "Reverse engineering source polarization error" Proc. SPIE 5992, (2005) paper

A. Estroff, Y. Fan, A. Bourov, B. Smith, "Mask-induced polarization effects at high numerical aperture" J. Microlith., Microfab., Microsyst. 4 (2005) paper

A. Estroff, Y. Fan, A. Bourov, B.W. Smith, P. Foubert, L.H.A. Leunissen, Y. Aksenov, "Mask Induced Polarization Effects at High NA", Proc. SPIE 5754, (2005) paper

B.W. Smith, L. Zavyalova, A. Estroff, "Benefiting from polarization - effects of high-NA on imaging", Proc. SPIE 5377, (2004) paper | presentation

A. Estroff, Y. Fan, A. Bourov, F. Cropanese, N. Lafferty, L. Zavyalova, B.W. Smith, "Mask induced polarization", Proc. SPIE 5377, (2004) paper | poster

B.W. Smith, J. Cashmore, "Challenges in high NA, polarization, and photoresists", Proc. SPIE 4691, (2002) paper

Copyright 2007 Society of Photo-Optical Instrumentation Engineers.
These papers were (will be) published in Proceedings of SPIE, Microlithography and are made available as electronic reprints (preprints) with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

Aberration Metrology | Immersion Fluids Research | Optical Extensions and Image Theory |Immersion Lithography | Thin Films Research | EUV
©1996-2012 Center for Nanolithography Research, Rochester Institute of Technology