US 11471980

Method and System for Ultrafast Laser-based Material Removal, Figuring and Polishing

Patent Number

US 11471980

Issue Date

Inventor(s)

Jie Qiao

Lauren L. Taylor

Document

Download PDF for patent US 11471980

Synopsis

Patent US 11,471,980 B2 describes a method and system for ultrafast laser-based material removal, figuring, and polishing. The invention focuses on optimizing ultrafast laser processing for various materials by incorporating physical modeling to understand laser/material interaction mechanisms and the impact of laser parameters. This approach aims to achieve high-quality surface modification with minimal heat accumulation, which is a significant challenge in precision laser processing.
A key novel aspect of this patent is its integrated approach to process optimization. It involves determining a laser fluence near the ablation threshold for a given material and pulse duration. Subsequently, it optimizes the repetition rate, scanning speed, and scanning strategy to minimize heat accumulation, recommending an operable line scan overlap between 50% to 85% for achieving smooth ultrafast-laser polishing while maintaining an optic-quality surface. This level of control over laser parameters, guided by a physical understanding of the interaction, distinguishes it from conventional trial-and-error methods. The method also enables the generation of highly specific surface patterns and features with precision.
The commercial potential of this invention is substantial across industries requiring high-precision material processing and surface finishing. The ability to achieve optic-quality surfaces with minimal thermal damage opens up new possibilities for manufacturing and customization.

Possible applications include:
Optics and Photonics: Precision figuring and polishing of optical components for lenses, mirrors, waveguides, and other optical instruments. This can lead to improved performance and reduced manufacturing costs for high-value optical elements.
Semiconductor Manufacturing: Advanced patterning, etching, and surface modification of semiconductor wafers. The minimal heat accumulation is crucial for fabricating delicate microelectronic circuits without damaging adjacent structures.
Medical Device Manufacturing: Precision machining of biocompatible materials for implants, surgical tools, and diagnostic devices, where surface quality and material integrity are paramount.
Aerospace and Defense: Fabrication of high-performance components from advanced materials that require precise dimensions and superior surface finishes for critical applications.
Automotive Industry: Manufacturing of engine components, sensors, and aesthetic parts with enhanced durability and performance through precise surface texturing or polishing.
Micro-electromechanical Systems (MEMS): Creation of intricate micro-structures and devices with high accuracy and minimal material distortion.

This technology offers a pathway to more efficient, precise, and less damaging laser material processing, enabling manufacturers to meet the increasing demands for high-quality components across a diverse range of advanced applications.