RIT Center for Nanolithography Research

Optical Extensions and Imaging Theory

Evanescent Wave Imaging Photoresist Modulation Curves Experimental Measurement of Photoresist Modulation Curves
Resist Process Window Characterization for the 45-nm Node Using an Interferometric Immersion Microstepper Photomask image enhancement using grating-generated surface waves Mask Enhancement Using an Evanescent Wave Effect

M. K. Sears, J. Bekaert, B. W. Smith, "Pupil wavefront manipulation for optical nanolithography", Proc. SPIE 8326, (2012) paper

M. K. Sears, G. Fenger, J. Mailfert, B. W. Smith, "Extending SMO into the lens pupil domain", Proc. SPIE 7973, (2011) paper

B. Baylav, M. Zhao, R. Yin, P. Xie, C. Scholz, B. W. Smith, T. Smith "Alternatives to Chemical Amplification for 193 nm Lithography" Proc. SPIE 7639, (2010) paper

A. Estroff, N. Lafferty, P. Xie, B. W. Smith, "Metamaterials for enhancement of DUV lithography" Proc. SPIE 7640, (2010) paper

B. W. Smith, "Alternative optical technologies: more than curiosities?", Proc. SPIE 7274, (2009) paper

B. W. Smith, "Design and analysis of a compact EUV interferometric lithography system", J. Microlith., Microfab., Microsyst. 8 (2009) paper

M. Kempsell, E. Hendrickx, A. Tritchkov, K. Sakajiri, K. Yasui, S. Yoshitake, Y. Granik, G. Vandenberghe, B. W. Smith, "Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture", J. Microlith., Microfab., Microsyst. 8 (2009) paper

P. Xie, B. W. Smith, "Analysis of Higher Order Pitch Division for sub-32 nm Lithography", Proc. SPIE 7274, (2009) paper

N. Lafferty, A. Estroff, B. W. Smith, "Photomask image enhancement using grating-generated surface waves", J. Vac. Sci. B, v26, n6, (2008) paper

N. Lafferty, J. Zhou, B. W. Smith, "Mask Enhancement Using and Evanescent Wave Effect", Proc. SPIE 6520,(2007) paper

R. D. Frankel, B. W. Smith, A. Estroff, "Quantum state control interference lithography and trim double patterning for 32-16 nm lithography", Proc. SPIE 6520,(2007) paper

A. Bourov, S. A. Robertson, B. W. Smith, M. A. Slocum, E. C. Piscani, "Experimental Measurement of Photoresist Modulation Curves", Proc. SPIE 6154, (2006) paper

A. Bourov, S. A. Robertson, B. W. Smith, M. A. Slocum, E. C. Piscani, "Resist Process Window Characterization for the 45-nm Node Using an Interferometric Immersion Microstepper", Proc. SPIE 6153, (2006) paper

Y. Fan, A. Bourov, M. Slocum, B. W. Smith, "Effects of Beam Pointing Instability on Two-Beam Interferometric Lithography", Proc. SPIE 6154, (2006) paper

B. W. Smith, Y. Fan, J. Zhou, N. Lafferty, A. Estroff, "Evanescent Wave Imaging in Optical Lithography", Proc. SPIE 6154, (2006) paper

A. Bourov, Y. Fan, F. C. Cropanese, B. W. Smith, "Photoresist Modulation Curves", Proc. SPIE 5754, (2005) paper

N. Lafferty, G. Vandenberghe, B.W. Smith, M. Lassiter, P. Martin, "Gray assist bar OPC", Proc. SPIE 5377, (2004) paper | presentation

F. Cropanese, A. Bourov, Y. Fan, A. Estroff, L. Zavyalova, B.W. Smith, "Synthesis of projection lithography for low k1 via interferometry", Proc. SPIE 5377, (2004) paper | poster

B. W. Smith, "Forbidden pitch or duty free: revealing the causes of across-pitch imaging differences", Proc. SPIE 5040, (2003) paper | presentation

B. W. Smith, G. Vandenberghe, "Image enhancement through square illumination shaping", Proc. SPIE 4691, (2002) paper

B. W. Smith, D. Ewbank, "OPC and image optimization using localized frequency analysis", Proc. SPIE 4691, (2002) paper

B. W. Smith, "Mutually optimizing resolution enhancement techniques: illumination, APSM, assist feature OPC, and gray bars", Proc. SPIE 4348, (2001) paper

B. W. Smith, L. Zavyalova, S. G. Smith, J. Petersen "Resolution and DOF improvement through the use of square-shaped illumination", Proc. SPIE 3679, (1999) paper

Copyright 2007 Society of Photo-Optical Instrumentation Engineers.
These papers were (will be) published in Proceedings of SPIE, Microlithography and are made available as electronic reprints (preprints) with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

Aberration Metrology | Immersion Fluids Research |Immersion Lithography | High NA and Polarization | Thin Films Research | EUV
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