Michael Jackson Headshot

Michael Jackson

Associate Professor
Department of Electrical and Microelectronic Engineering
Kate Gleason College of Engineering

585-475-2828
Office Location

Michael Jackson

Associate Professor
Department of Electrical and Microelectronic Engineering
Kate Gleason College of Engineering

Education

BS, MS, Ph.D., State University of New York at Buffalo

585-475-2828

Areas of Expertise

Currently Teaching

MCEE-503
3 Credits
This course focuses on the deposition and etching of thin films of conductive and insulating materials for IC fabrication. A thorough overview of vacuum technology is presented to familiarize the student with the challenges of creating and operating in a controlled environment. Physical and Chemical Vapor Deposition (PVD & CVD) are discussed as methods of film deposition. Plasma etching and Chemical Mechanical Planarization (CMP) are studied as methods for selective removal of materials. Applications of these fundamental thin film processes to IC manufacturing are presented.
MCEE-603
3 Credits
This course focuses on the deposition and etching of thin films of conductive and insulating materials for IC fabrication. A thorough overview of vacuum technology is presented to familiarize the student with the challenges of creating and operating in a controlled environment. Physical and Chemical Vapor Deposition (PVD & CVD) are discussed as methods of film deposition. Plasma etching and Chemical Mechanical Planarization (CMP) are studied as methods for selective removal of materials. Applications of these fundamental thin film processes to IC manufacturing are presented. Graduate paper required.
MCEE-320
3 Credits
An introduction to the fundamentals of electrostatic, magneto-static and time varying fields that culminate with the Maxwell's equations, continuity and Lorentz force that govern the EM phenomena. Importance of Laplace's and Poisson's equations in semiconductor applications is described. Electromagnetic properties of material media are discussed with emphasis on boundary conditions. Plane wave solution of Maxwell's equations is derived and discussed in loss-less and lossy media. Applications in optics include reflection/refraction and polarization of light. A strong knowledge of vector calculus is desired.
MCEE-496
3 Credits
A capstone design experience for microelectronic engineering senior students. In this course, students conduct a hands-on implementation of the projects proposed in the previous course, Senior Design Project I. Technical presentations of the results, including a talk and a poster, are required at the annual conference on microelectronic engineering organized by the program. A written paper in IEEE format is required and is included in the conference journal.
MCEE-201
3 Credits
An introduction to the basics of integrated circuit fabrication. The electronic properties of semiconductor materials and basic device structures are discussed, along with fabrication topics including photolithography diffusion and oxidation, ion implantation, and metallization. The laboratory uses a four-level metal gate PMOS process to fabricate an IC chip and provide experience in device design - and layout (CAD), process design, in-process characterization and device testing. Students will understand the basic interaction between process design, device design and device layout.
MCEE-601
3 Credits
This course introduces the beginning graduate student to the fabrication of solid-state devices and integrated circuits. The course presents an introduction to basic electronic components and devices, lay outs, unit processes common to all IC technologies such as substrate preparation, oxidation, diffusion and ion implantation. The course will focus on basic silicon processing. The students will be introduced to process modeling using a simulation tool such as SUPREM. The lab consists of conducting a basic metal gate PMOS process in the RIT clean room facility to fabricate and test a PMOS integrated circuit test ship. Laboratory work also provides an introduction to basic IC fabrication processes and safety.

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Invited Keynote/Presentation
Jackson, Michael A. and Santosh K. Kurinec. "K - 12 to Workforce for Semiconductor Industry." NEATEC: NorthEast Advanced Technology Education Center. NEATEC. Hudson Valley Communtiy College, Troy, NY. 29 Nov. 2011. Conference Presentation.