Chemistry Seminar: The Role and Migration of Chromium Underlayer in Flash Lamp Annealed LTPS
The Role and Migration of Chromium Underlayer in Flash Lamp Annealed LTPS
Materials Science and Engineering MS Candidate
School of Chemistry and Materials Science, RIT
Mr. Hum will present on his thesis proposal involving chromium adhesive layer changes with varying thicknesses of amorphous silicon (a-Si).
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Low temperature Poly-silicon is a useful material for a variety of thin film electronic devices. For large substrates with low thermal budgets, a high efficiency crystallization method such as Flash Lamp annealing (FLA) is necessary. FLA utilizes a xenon flash lamp on the order of 10-100 µs to crystalize the surface of a substrate. The rapid thermal energy often causes problems with the substrate, which necessitates an adhesion layer. Chromium adhesive layers have been used previously with thicker amorphous silicon (a-Si) films to rectify such issues. 60nm of amorphous silicon (a-Si) thin film mesas on a glass substrate were crystallized with flash lamp annealing (FLA), using chromium as an underlayer. The mesas exhibited large lateral grain growth compared to samples without Cr. Preliminary analysis indicated that voids in the topography were originating from the surface. This suggests that the Cr is promoting wetting while partially diffusing through the a-Si. Additional experiments with varying a-Si thickness of 10 nm – 100 nm will be used to understand the role of Chromium as an adhesion layer or a part of metal induced crystallization. Samples will be analyzed with AFM, SEM and EDS. Understanding why and how Cr propagates through the silicon is necessary for minimizing metal contamination effects and deep level traps.
Matt Hum is a first-year master’s student currently enrolled in Materials Science and Engineering Program at RIT. He received his undergraduate degree in Engineering Physics from Fordham University. During his undergrad years Matt was a member of Engineers Without Borders (EWB), representing the school at the EWB’s regional convention Syracuse, NY.
Undergraduates, graduates, and experts. Those with interest in the topic.
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Open to the Public