Microelectronics Manufacturing Engineering ME

A degree driven by real-time employer demand

These jobs will grow 16% by 2026, more than double the rate of the overall labor market. 

The microelectronics manufacturing engineering job market

100%

Graduate outcomes rate

91k+

Average salary nationwide

26%

Demand growth for microelectronics skills

81%

Demand growth for data analysis skills

Program Highlights

The master of engineering in microelectronics manufacturing engineering provides a broad-based education for students who are interested in a career in the semiconductor industry and hold a bachelor’s degree in traditional engineering or other science disciplines.

This degree is awarded upon the successful completion of six core courses, two elective courses, a research methods course, and an internship. Under certain circumstances, a student may be required to complete bridge courses totaling more than the minimum number of credits. Students complete courses in microelectronics, microlithography, and manufacturing.

After you successfully complete this degree program, you will be able to: 

  • Design and understand a sequence of processing steps to fabricate a solid state device to meet a set of geometric, electrical, and/or processing parameters.
  • Analyze experimental electrical data from a solid state device to extract performance parameters for comparison to modeling parameters used in the device design.
  • Understand current lithographic materials, processes, and systems to meet imaging and/or device patterning requirements.
  • Understand the relevance of a process or device, either proposed or existing, to current manufacturing practices.
  • Perform in a microelectronic engineering environment, as evidenced by an internship.
  • Appreciate the areas of specialty in the field of microelectronics, such as device engineering, circuit design, lithography, materials and processes, and yield and manufacturing.

Curriculum packed with high-demand skills

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Analytics

Demand for data analytics skills is growing 82% in this field.

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Physics

This sought-after skill by employers carries a salary premium in this field.

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Simulation

Simulation skills are growing plus they offer a competitive advantage and salary premium in the employment market.

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Experimental Design

Skills acquired in this degree like experimental design and process are highly sought after by employers in this field.

Curriculum

MCEE-601
Credits 3
This course introduces the beginning graduate student to the fabrication of solid-state devices and integrated circuits. The course presents an introduction to basic electronic components and devices, lay outs, unit processes common to all IC technologies such as substrate preparation, oxidation, diffusion and ion implantation. The course will focus on basic silicon processing. The students will be introduced to process modeling using a simulation tool such as SUPREM. The lab consists of conducting a basic metal gate PMOS process in the RIT clean room facility to fabricate and test a PMOS integrated circuit test ship. Laboratory work also provides an introduction to basic IC fabrication processes and safety.
MCEE-605
Credits 3
Microlithography Materials and Processes covers the chemical aspects of microlithography and resist processes. Fundamentals of polymer technology will be addressed and the chemistry of various resist platforms including novolac, styrene, and acrylate systems will be covered. Double patterning materials will also be studied. Topics include the principles of photoresist materials, including polymer synthesis, photochemistry, processing technologies and methods of process optimization. Also advanced lithographic techniques and materials, including multi-layer techniques for BARC, double patterning, TARC, and next generation materials and processes are applied to optical lithography. Graduate paper required.
MCEE-603
Credits 3
This course focuses on the deposition and etching of thin films of conductive and insulating materials for IC fabrication. A thorough overview of vacuum technology is presented to familiarize the student with the challenges of creating and operating in a controlled environment. Physical and Chemical Vapor Deposition (PVD & CVD) are discussed as methods of film deposition. Plasma etching and Chemical Mechanical Planarization (CMP) are studied as methods for selective removal of materials. Applications of these fundamental thin film processes to IC manufacturing are presented. Graduate paper required.
MCEE-795
Credits 1
Weekly seminar series intended to present the state of the art in microelectronics research. Other research-related topics will be presented such as library search techniques, contemporary issues, ethics, patent considerations, small business opportunities, technical writing, technical reviews, effective presentations, etc.
MCEE-732
Credits 3
This course focuses on CMOS manufacturing. Topics include CMOS process technology, work in progress tracking, CMOS calculations, process technology, long channel and short channel MOSFET, isolation technologies, back-end processing and packaging. Associated is a lab for on-campus section (01) and a graduate paper/case study for distance learning section (90). The laboratory for this course is the student-run factory. Topics include Lot tracking, query processing, data collection, lot history, cycle time, turns, CPK and statistical process control, measuring factory performance, factory modeling and scheduling, cycle time management, cost of ownership, defect reduction and yield enhancement, reliability, process modeling and RIT's advanced CMOS process. Silicon wafers are processed through an entire CMOS process and tested. Students design unit processes and integrate them into a complete process. Students evaluate the process steps with calculations, simulations and lot history, and test completed devices.
MCEE-602
Credits 3
This is an advanced level course in Integrated Circuit Devices and process technology. A detailed study of processing modules in modern semiconductor fabrication sequences will be done through simulation. Device engineering challenges such as shallow-junction formation, fin FETs, ultra-thin gate dielectrics, and replacement metal gates are covered. Particular emphasis will be placed on non-equilibrium effects. Silvaco Athena and Atlas will be used extensively for process simulation. Graduate paper required.
MCEE-615
Credits 3
An advanced course covering the physical aspects of micro- and nano-lithography. Image formation in projection and proximity systems are studied. Makes use of optical concepts as applied to lithographic systems. Fresnel diffraction, Fraunhofer diffraction, and Fourier optics are utilized to understand diffraction-limited imaging processes and optimization. Topics include illumination, lens parameters, image assessment, resolution, phase-shift masking, and resist interactions as well as non-optical systems such as EUV, maskless, e-beam, and nanoimprint. Lithographic systems are designed and optimized through use of modeling and simulation packages. Graduate paper required.
MCEE-777
Credits 1 - 4
This course number is used to fulfill the internship requirement for the master of engineering degree program. The student must obtain the approval of the department head before registering for this course.

Electives

 
Graduate Electives
Credits 6

Admission Requirements

  • Complete the graduate application.
  • Have a minimum undergraduate GPA of 3.0 or higher preferred
  • Submit official transcripts (in English) of all previously completed undergraduate and graduate course work
  • Submit a current resume and a personal statement
  • Submit two letters of recommendation from individuals well qualified to judge the candidate's ability for graduate study
  • Applicants must hold a baccalaureate degree in electrical, chemical engineering or the equivalent, from an accredited college or university in good academic standing and at least one year of study and / or experience in semiconductor device physics, VLSI design, and semiconductor fabrication technology
  • An undergraduate grade point average of 3.0 or better on a 4.0 scale or supervisor recommendations are required
  • A test of English Language aptitude is required of all applicants and course registrants whose native language is not English. Applicants are exempt from submitting the exams if they have worked or studied in the U.S. for the last two years or they are from countries and attended universities whose native language is English. 
  • The Graduate Record Exam (GRE) scores are not mandatory but may support the candidacy
  • Candidates applying with a bachelor's degree in non-electrical or non-microelectronic engineering fields may be considered for admission, however they may be required to complete additional bridge courses to ensure they are adequately prepared for graduate study.

Cost

The online MS in Microelectronics Manufacturing Engineering requires 30 credits and costs $1,237 per credit hour (Academic Year 2021 – 2022). This tuition reflects the RIT Online discount of 43% off the campus-based program cost.

Keep in mind that there are many options available that may help you lower your costs including: 

  • Military tuition benefits
  • Support from employers 
  • Private scholarships 
  • Financing 
  • Payment plans 

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