Microelectronics Manufacturing Engineering Master of Engineering Degree

Engineer the world of microelectronics with an ME program in Microelectronics Manufacturing Engineering. Innovate at the microscale.

Overview for Microelectronics Manufacturing Engineering ME

The ME in microelectronics manufacturing engineering is no longer accepting applications for admission. Students interested in studying in this field should refer to the MS program in microelectronic engineering.

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Careers and Salary Info

Typical Job Titles

Development Engineer Device Engineer
Equipment Engineer Manufacturing Yield Engineer
Photolithography Engineer Process Engineer
Process Integration Engineer Product Engineer
Research Engineer

Curriculum for 2023-2024 for Microelectronics Manufacturing Engineering ME

Current Students: See Curriculum Requirements

Microelectronic Manufacturing Engineering, ME degree, typical course sequence

Course Sem. Cr. Hrs.
First Year
MCEE-601
Microelectronic Fabrication
This course introduces the beginning graduate student to the fabrication of solid-state devices and integrated circuits. The course presents an introduction to basic electronic components and devices, lay outs, unit processes common to all IC technologies such as substrate preparation, oxidation, diffusion and ion implantation. The course will focus on basic silicon processing. The students will be introduced to process modeling using a simulation tool such as SUPREM. The lab consists of conducting a basic metal gate PMOS process in the RIT clean room facility to fabricate and test a PMOS integrated circuit test ship. Laboratory work also provides an introduction to basic IC fabrication processes and safety. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3, Lecture 3 (Fall).
3
MCEE-602
Semiconductor Process Integration
This is an advanced level course in Integrated Circuit Devices and process technology. A detailed study of processing modules in modern semiconductor fabrication sequences will be done through simulation. Device engineering challenges such as shallow-junction formation, fin FETs, ultra-thin gate dielectrics, and replacement metal gates are covered. Particular emphasis will be placed on non-equilibrium effects. Silvaco Athena and Atlas will be used extensively for process simulation. Graduate paper required. (Prerequisites: MCEE-601 or equivalent course.) Lab 2, Lecture 3 (Spring).
3
MCEE-603
Thin Films
This course focuses on the deposition and etching of thin films of conductive and insulating materials for IC fabrication. A thorough overview of vacuum technology is presented to familiarize the student with the challenges of creating and operating in a controlled environment. Physical and Chemical Vapor Deposition (PVD & CVD) are discussed as methods of film deposition. Plasma etching and Chemical Mechanical Planarization (CMP) are studied as methods for selective removal of materials. Applications of these fundamental thin film processes to IC manufacturing are presented. Graduate paper required. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3, Lecture 2 (Fall).
3
MCEE-605
Lithography Materials and Processes
Microlithography Materials and Processes covers the chemical aspects of microlithography and resist processes. Fundamentals of polymer technology will be addressed and the chemistry of various resist platforms including novolac, styrene, and acrylate systems will be covered. Double patterning materials will also be studied. Topics include the principles of photoresist materials, including polymer synthesis, photochemistry, processing technologies and methods of process optimization. Also advanced lithographic techniques and materials, including multi-layer techniques for BARC, double patterning, TARC, and next generation materials and processes are applied to optical lithography. Graduate paper required. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3, Lecture 3 (Fall, Spring).
3
MCEE-615
Nanolithography Systems
An advanced course covering the physical aspects of micro- and nano-lithography. Image formation in projection and proximity systems are studied. Makes use of optical concepts as applied to lithographic systems. Fresnel diffraction, Fraunhofer diffraction, and Fourier optics are utilized to understand diffraction-limited imaging processes and optimization. Topics include illumination, lens parameters, image assessment, resolution, phase-shift masking, and resist interactions as well as non-optical systems such as EUV, maskless, e-beam, and nanoimprint. Lithographic systems are designed and optimized through use of modeling and simulation packages. Graduate paper required. (Prerequisites: MCEE-605 or equivalent course.) Lab 3, Lecture 3 (Fall, Spring).
3
MCEE-732
Microelectronics Manufacturing
This course focuses on CMOS manufacturing. Topics include CMOS process technology, work in progress tracking, CMOS calculations, process technology, long channel and short channel MOSFET, isolation technologies, back-end processing and packaging. Associated is a lab for on-campus section (01) and a graduate paper/case study for distance learning section (90). The laboratory for this course is the student-run factory. Topics include Lot tracking, query processing, data collection, lot history, cycle time, turns, CPK and statistical process control, measuring factory performance, factory modeling and scheduling, cycle time management, cost of ownership, defect reduction and yield enhancement, reliability, process modeling and RIT's advanced CMOS process. Silicon wafers are processed through an entire CMOS process and tested. Students design unit processes and integrate them into a complete process. Students evaluate the process steps with calculations, simulations and lot history, and test completed devices. (Prerequisites: MCEE-601 or equivalent course.) Lecture 8 (Spring).
3
MCEE-795
Microelectronics Research Methods
Weekly seminar series intended to present the state of the art in microelectronics research. Other research-related topics will be presented such as library search techniques, contemporary issues, ethics, patent considerations, small business opportunities, technical writing, technical reviews, effective presentations, etc. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Seminar 1 (Fall, Spring).
2
Choose one of the following:
3
   MCEE-777
   Master of Engineering Internship
This course number is used to fulfill the internship requirement for the master of engineering degree program. The student must obtain the approval of the department head before registering for this course. (Enrollment in this course requires permission from the department offering the course.) Internship (Fall, Spring, Summer).
 
 
   Graduate Elective
 
Second Year
MCEE-795
Microelectronics Research Methods
Weekly seminar series intended to present the state of the art in microelectronics research. Other research-related topics will be presented such as library search techniques, contemporary issues, ethics, patent considerations, small business opportunities, technical writing, technical reviews, effective presentations, etc. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Seminar 1 (Fall, Spring).
1
 
Graduate Electives
6
Total Semester Credit Hours
30

 

Note for online students

The frequency of required and elective course offerings in the online program will vary, semester by semester, and will not always match the information presented here. Online students are advised to seek guidance from the listed program contact when developing their individual program course schedule.

Admissions and Financial Aid

This program is available on-campus only.

Offered Admit Term(s) Application Deadline STEM Designated
Full‑time Fall/Spring Rolling No

Full-time study is 9+ semester credit hours. International students requiring a visa to study at the RIT Rochester campus must study full‑time.

Application Details

To be considered for admission to the Microelectronics Manufacturing Engineering ME program, candidates must fulfill the following requirements:

English Language Test Scores

International applicants whose native language is not English must submit one of the following official English language test scores. Some international applicants may be considered for an English test requirement waiver.

TOEFL IELTS PTE Academic
79 6.5 58

International students below the minimum requirement may be considered for conditional admission. Each program requires balanced sub-scores when determining an applicant’s need for additional English language courses.

How to Apply Start or Manage Your Application

Cost and Financial Aid

An RIT graduate degree is an investment with lifelong returns. Graduate tuition varies by degree, the number of credits taken per semester, and delivery method. View the general cost of attendance or estimate the cost of your graduate degree.

A combination of sources can help fund your graduate degree. Learn how to fund your degree

Additional Information

Online Study Restrictions for Some International Students

Certain countries are subject to comprehensive embargoes under US Export Controls, which prohibit virtually ALL exports, imports, and other transactions without a license or other US Government authorization. Learners from the Crimea region of the Ukraine, Cuba, Iran, North Korea, and Syria may not register for RIT online courses. Nor may individuals on the United States Treasury Department’s list of Specially Designated Nationals or the United States Commerce Department’s table of Deny Orders. By registering for RIT online courses, you represent and warrant that you are not located in, under the control of, or a national or resident of any such country or on any such list.

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