Microelectronics Manufacturing Engineering Master of Engineering Degree
Microelectronics Manufacturing Engineering
Master of Engineering Degree
Overview for Microelectronics Manufacturing Engineering ME
The ME in microelectronics manufacturing engineering is no longer accepting applications for admission. Students interested in studying in this field should refer to the MS program in microelectronic engineering.
This program is no longer accepting new student applications.
Curriculum for 2023-2024 for Microelectronics Manufacturing Engineering ME
Current Students: See Curriculum Requirements
Microelectronic Manufacturing Engineering, ME degree, typical course sequence
| Course | Sem. Cr. Hrs. | |
|---|---|---|
| First Year | ||
| MCEE-601 | Microelectronic Fabrication This course introduces the beginning graduate student to the fabrication of solid-state devices and integrated circuits. The course presents an introduction to basic electronic components and devices, lay outs, unit processes common to all IC technologies such as substrate preparation, oxidation, diffusion and ion implantation. The course will focus on basic silicon processing. The students will be introduced to process modeling using a simulation tool such as SUPREM. The lab consists of conducting a basic metal gate PMOS process in the RIT clean room facility to fabricate and test a PMOS integrated circuit test ship. Laboratory work also provides an introduction to basic IC fabrication processes and safety. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3 (Fall). |
3 |
| MCEE-602 | Semiconductor Process Integration This is an advanced level course in Integrated Circuit Devices and process technology. A detailed study of processing modules in modern semiconductor fabrication sequences will be done through simulation. Device engineering challenges such as shallow-junction formation, fin FETs, ultra-thin gate dielectrics, and replacement metal gates are covered. Particular emphasis will be placed on non-equilibrium effects. Silvaco Athena and Atlas will be used extensively for process simulation. Graduate paper required. (Prerequisites: MCEE-601 or equivalent course.) Lab 2 (Spring). |
3 |
| MCEE-603 | Thin Films This course focuses on the deposition and etching of thin films of conductive and insulating materials for IC fabrication. A thorough overview of vacuum technology is presented to familiarize the student with the challenges of creating and operating in a controlled environment. Physical and Chemical Vapor Deposition (PVD & CVD) are discussed as methods of film deposition. Plasma etching and Chemical Mechanical Planarization (CMP) are studied as methods for selective removal of materials. Applications of these fundamental thin film processes to IC manufacturing are presented. Graduate paper required. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3 (Fall). |
3 |
| MCEE-605 | Lithography Materials and Processes Microlithography Materials and Processes covers the chemical aspects of microlithography and resist processes. Fundamentals of polymer technology will be addressed and the chemistry of various resist platforms including novolac, styrene, and acrylate systems will be covered. Double patterning materials will also be studied. Topics include the principles of photoresist materials, including polymer synthesis, photochemistry, processing technologies and methods of process optimization. Also advanced lithographic techniques and materials, including multi-layer techniques for BARC, double patterning, TARC, and next generation materials and processes are applied to optical lithography. Graduate paper required. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3 (Fall, Spring). |
3 |
| MCEE-615 | Nanolithography Systems An advanced course covering the physical aspects of micro- and nano-lithography. Image formation in projection and proximity systems are studied. Makes use of optical concepts as applied to lithographic systems. Fresnel diffraction, Fraunhofer diffraction, and Fourier optics are utilized to understand diffraction-limited imaging processes and optimization. Topics include illumination, lens parameters, image assessment, resolution, phase-shift masking, and resist interactions as well as non-optical systems such as EUV, maskless, e-beam, and nanoimprint. Lithographic systems are designed and optimized through use of modeling and simulation packages. Graduate paper required. (Prerequisites: MCEE-605 or equivalent course.) Lab 3 (Fall, Spring). |
3 |
| MCEE-732 | Microelectronics Manufacturing This course focuses on CMOS manufacturing. Topics include CMOS process technology, work in progress tracking, CMOS calculations, process technology, long channel and short channel MOSFET, isolation technologies, back-end processing and packaging. Associated is a lab for on-campus section (01) and a graduate paper/case study for distance learning section (90). The laboratory for this course is the student-run factory. Topics include Lot tracking, query processing, data collection, lot history, cycle time, turns, CPK and statistical process control, measuring factory performance, factory modeling and scheduling, cycle time management, cost of ownership, defect reduction and yield enhancement, reliability, process modeling and RIT's advanced CMOS process. Silicon wafers are processed through an entire CMOS process and tested. Students design unit processes and integrate them into a complete process. Students evaluate the process steps with calculations, simulations and lot history, and test completed devices. (Prerequisites: MCEE-601 or equivalent course.) Lecture 8 (Spring). |
3 |
| MCEE-795 | Microelectronics Research Methods Weekly seminar series intended to present the state of the art in microelectronics research. Other research-related topics will be presented such as library search techniques, contemporary issues, ethics, patent considerations, small business opportunities, technical writing, technical reviews, effective presentations, etc. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Seminar 1 (Fall, Spring). |
2 |
| Choose one of the following: | 3 |
|
| MCEE-777 | Master of Engineering Internship This course number is used to fulfill the internship requirement for the master of engineering degree program. The student must obtain the approval of the department head before registering for this course. (Enrollment in this course requires permission from the department offering the course.) Internship (Fall, Spring, Summer). |
|
Graduate Elective |
||
| Second Year | ||
| MCEE-795 | Microelectronics Research Methods Weekly seminar series intended to present the state of the art in microelectronics research. Other research-related topics will be presented such as library search techniques, contemporary issues, ethics, patent considerations, small business opportunities, technical writing, technical reviews, effective presentations, etc. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Seminar 1 (Fall, Spring). |
1 |
Graduate Electives |
6 | |
| Total Semester Credit Hours | 30 |
|
Note for online students
The frequency of required and elective course offerings in the online program will vary, semester by semester, and will not always match the information presented here. Online students are advised to seek guidance from the listed program contact when developing their individual program course schedule.
Admissions and Financial Aid
This program is available on-campus only.
| Offered | Admit Term(s) | Application Deadline | STEM Designated |
|---|---|---|---|
| Full‑time | Fall/Spring | Rolling | No |
Full-time study is 9+ semester credit hours. International students requiring a visa to study at the RIT Rochester campus must study full‑time.
Application Details
To be considered for admission to the Microelectronics Manufacturing Engineering ME program, candidates must fulfill the following requirements:
- Complete an online graduate application.
- Submit copies of official transcript(s) (in English) of all previously completed undergraduate and graduate course work, including any transfer credit earned.
- Hold a baccalaureate degree (or US equivalent) from an accredited university or college.
- A recommended minimum cumulative GPA of 3.0 (or equivalent).
- Submit a current resume or curriculum vitae.
- Submit a personal statement of educational objectives.
- Submit two letters of recommendation.
- Entrance exam requirements: None
- Writing samples are optional.
- Submit English language test scores (TOEFL, IELTS, PTE Academic), if required. Details are below.
English Language Test Scores
International applicants whose native language is not English must submit one of the following official English language test scores. Some international applicants may be considered for an English test requirement waiver.
| TOEFL | IELTS | PTE Academic |
|---|---|---|
| 79 | 6.5 | 58 |
International students below the minimum requirement may be considered for conditional admission. Each program requires balanced sub-scores when determining an applicant’s need for additional English language courses.
How to Apply Start or Manage Your Application
Cost and Financial Aid
An RIT graduate degree is an investment with lifelong returns. Graduate tuition varies by degree, the number of credits taken per semester, and delivery method. View the general cost of attendance or estimate the cost of your graduate degree.
A combination of sources can help fund your graduate degree. Learn how to fund your degree
Additional Information
Online Study Restrictions for Some International Students
Certain countries are subject to comprehensive embargoes under US Export Controls, which prohibit virtually ALL exports, imports, and other transactions without a license or other US Government authorization. Learners from the Crimea region of the Ukraine, Cuba, Iran, North Korea, and Syria may not register for RIT online courses. Nor may individuals on the United States Treasury Department’s list of Specially Designated Nationals or the United States Commerce Department’s table of Deny Orders. By registering for RIT online courses, you represent and warrant that you are not located in, under the control of, or a national or resident of any such country or on any such list.
Latest News
-
February 1, 2023
![three researchers wearing clean suits working in a cleanroom.]()
Upcoming changes will advance semiconductor research
RIT is building upon its successful history of semiconductor development and research through an expansion to its cleanroom facility with help from New York state.
-
November 18, 2022
![three people in clean suits looking at a computer chip.]()
Chips 101 showcases RIT and Upstate NY skills in computer chip development and manufacturing
Becoming the Silicon Valley of the Northeast may have as much power as the computer chips that will soon be designed and developed in the upstate New York region. The recent Chips 101 event, hosted by RIT on Nov. 16, kept to that premise. More than 50 regional government and corporate representatives learned how computer chips are designed and manufactured—and how universities, government, and workforce development initiatives will contribute to this area.
-
July 29, 2022
![close-up of a semiconductor chip under a microscope.]()
‘Cautiously optimistic:’ RIT professor discusses chip bill
WROC-TV talks to Robert Pearson, associate professor in the Department of Electrical and Microelectronic Engineering, about a bill to boost the semiconductor industry.
