Microelectronics Manufacturing Engineering Master of Engineering Degree
Microelectronics Manufacturing Engineering
Master of Engineering Degree
Overview
The ME in microelectronics manufacturing engineering is no longer accepting applications for admission. Students interested in studying in this field should refer to the MS program in microelectronic engineering.
This program is no longer accepting new student applications.
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Careers and Salary Info
Typical Job Titles
| Development Engineer | Device Engineer |
| Equipment Engineer | Manufacturing Yield Engineer |
| Photolithography Engineer | Process Engineer |
| Process Integration Engineer | Product Engineer |
| Research Engineer |
Salary and Career Information for Microelectronics Manufacturing Engineering ME
Curriculum for Microelectronics Manufacturing Engineering ME
Microelectronic Manufacturing Engineering, ME degree, typical course sequence
| Course | Sem. Cr. Hrs. | |
|---|---|---|
| First Year | ||
| MCEE-601 | Microelectronic Fabrication This course introduces the beginning graduate student to the fabrication of solid-state devices and integrated circuits. The course presents an introduction to basic electronic components and devices, lay outs, unit processes common to all IC technologies such as substrate preparation, oxidation, diffusion and ion implantation. The course will focus on basic silicon processing. The students will be introduced to process modeling using a simulation tool such as SUPREM. The lab consists of conducting a basic metal gate PMOS process in the RIT clean room facility to fabricate and test a PMOS integrated circuit test ship. Laboratory work also provides an introduction to basic IC fabrication processes and safety. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3, Lecture 3 (Fall). |
3 |
| MCEE-602 | Semiconductor Process Integration This is an advanced level course in Integrated Circuit Devices and process technology. A detailed study of processing modules in modern semiconductor fabrication sequences will be done through simulation. Device engineering challenges such as shallow-junction formation, fin FETs, ultra-thin gate dielectrics, and replacement metal gates are covered. Particular emphasis will be placed on non-equilibrium effects. Silvaco Athena and Atlas will be used extensively for process simulation. Graduate paper required. (Prerequisites: MCEE-601 or equivalent course.) Lab 2, Lecture 3 (Spring). |
3 |
| MCEE-603 | Thin Films This course focuses on the deposition and etching of thin films of conductive and insulating materials for IC fabrication. A thorough overview of vacuum technology is presented to familiarize the student with the challenges of creating and operating in a controlled environment. Physical and Chemical Vapor Deposition (PVD & CVD) are discussed as methods of film deposition. Plasma etching and Chemical Mechanical Planarization (CMP) are studied as methods for selective removal of materials. Applications of these fundamental thin film processes to IC manufacturing are presented. Graduate paper required. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3, Lecture 2 (Fall). |
3 |
| MCEE-605 | Lithography Materials and Processes Microlithography Materials and Processes covers the chemical aspects of microlithography and resist processes. Fundamentals of polymer technology will be addressed and the chemistry of various resist platforms including novolac, styrene, and acrylate systems will be covered. Double patterning materials will also be studied. Topics include the principles of photoresist materials, including polymer synthesis, photochemistry, processing technologies and methods of process optimization. Also advanced lithographic techniques and materials, including multi-layer techniques for BARC, double patterning, TARC, and next generation materials and processes are applied to optical lithography. Graduate paper required. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3, Lecture 3 (Fall, Spring). |
3 |
| MCEE-615 | Nanolithography Systems An advanced course covering the physical aspects of micro- and nano-lithography. Image formation in projection and proximity systems are studied. Makes use of optical concepts as applied to lithographic systems. Fresnel diffraction, Fraunhofer diffraction, and Fourier optics are utilized to understand diffraction-limited imaging processes and optimization. Topics include illumination, lens parameters, image assessment, resolution, phase-shift masking, and resist interactions as well as non-optical systems such as EUV, maskless, e-beam, and nanoimprint. Lithographic systems are designed and optimized through use of modeling and simulation packages. Graduate paper required. (Prerequisites: MCEE-605 or equivalent course.) Lab 3, Lecture 3 (Fall, Spring). |
3 |
| MCEE-732 | Microelectronics Manufacturing This course focuses on CMOS manufacturing. Topics include CMOS process technology, work in progress tracking, CMOS calculations, process technology, long channel and short channel MOSFET, isolation technologies, back-end processing and packaging. Associated is a lab for on-campus section (01) and a graduate paper/case study for distance learning section (90). The laboratory for this course is the student-run factory. Topics include Lot tracking, query processing, data collection, lot history, cycle time, turns, CPK and statistical process control, measuring factory performance, factory modeling and scheduling, cycle time management, cost of ownership, defect reduction and yield enhancement, reliability, process modeling and RIT's advanced CMOS process. Silicon wafers are processed through an entire CMOS process and tested. Students design unit processes and integrate them into a complete process. Students evaluate the process steps with calculations, simulations and lot history, and test completed devices. (Prerequisites: MCEE-601 or equivalent course.) Lecture 8 (Spring). |
3 |
| MCEE-795 | Microelectronics Research Methods Weekly seminar series intended to present the state of the art in microelectronics research. Other research-related topics will be presented such as library search techniques, contemporary issues, ethics, patent considerations, small business opportunities, technical writing, technical reviews, effective presentations, etc. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Seminar 1 (Fall, Spring). |
2 |
| Choose one of the following: | 3 |
|
| MCEE-777 | Master of Engineering Internship This course number is used to fulfill the internship requirement for the master of engineering degree program. The student must obtain the approval of the department head before registering for this course. (Enrollment in this course requires permission from the department offering the course.) Internship (Fall, Spring, Summer). |
|
Graduate Elective |
||
| Second Year | ||
| MCEE-795 | Microelectronics Research Methods Weekly seminar series intended to present the state of the art in microelectronics research. Other research-related topics will be presented such as library search techniques, contemporary issues, ethics, patent considerations, small business opportunities, technical writing, technical reviews, effective presentations, etc. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Seminar 1 (Fall, Spring). |
1 |
Graduate Electives |
6 | |
| Total Semester Credit Hours | 30 |
|
Admission Requirements
To be considered for admission to the ME program in microelectronic manufacturing engineering, candidates must fulfill the following requirements:
- Complete an online graduate application. Refer to Graduate Admission Deadlines and Requirements for information on application deadlines, entry terms, and more.
- Submit copies of official transcript(s) (in English) of all previously completed undergraduate and graduate coursework, including any transfer credit earned.
- Hold a baccalaureate degree (or US equivalent) from an accredited university or college in engineering or a related field.
- Recommended minimum cumulative GPA of 3.0 (or equivalent).
- Submit a current resume or curriculum vitae.
- Two letters of recommendation are required. Refer to Application Instructions and Requirements for additional information.
- For entrance exam requirements (GMAT or GRE), refer to Graduate Admission Deadlines and Requirements.
- Submit a personal statement of educational objectives. Refer to Application Instructions and Requirements for additional information.
- Applicants with a bachelor’s degree in non-electrical or non-microelectronic engineering fields may be considered for admission, however they may be required to complete additional bridge courses to ensure they are adequately prepared for graduate study.
- International applicants whose native language is not English must submit official test scores from the TOEFL, IELTS, or PTE. Students below the minimum requirement may be considered for conditional admission. Refer to Graduate Admission Deadlines and Requirements for additional information on English requirements. International applicants may be considered for an English test requirement waiver. Refer to Additional Requirements for International Applicants to review waiver eligibility.
Learn about admissions, cost, and financial aid
Latest News
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April 12, 2022
![professor receiving an award at a podium.]()
Computer chip technology aligns with RIT’s microelectronic engineering program growth
Research findings and signs of computer chip industry demands were the top subjects at the 40th Annual Microelectronic Engineering Conference April 8 at RIT. With indications of growth and novel functions being developed, there were also discussions of the pressing need for even more skilled workers in the field to sustain that expected growth.
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February 3, 2022
![researcher wearing a clean suit in a clean room.]()
Semiconductors at RIT: What they are, how their lab makes them, and how they teach them
WROC-TV talks to Sean Rommel, professor and director of the microelectronic engineering program, and Michael Jackson, associate professor in the Department of Electrical and Microelectronic Engineering, about semiconductors.
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May 20, 2021
![environmental portrait of professor Lynn Fuller.]()
Microelectronic engineering program founder retires from Kate Gleason College of Engineering
President Joe Biden recently called for more resources to bolster the computer chip industry to meet consumer and commercial demands. Lynn Fuller has done more than his share to provide assets for this important industry. Fuller established the first microelectronic engineering program in the country in 1982 at RIT, and today many program graduates lead efforts at the top microchip firms advising the president.
