Microelectronic Engineering MS - Curriculum

This course introduces the beginning graduate student to the fabrication of solid-state devices and integrated circuits. The course presents an introduction to basic electronic components and devices, lay outs, unit processes common to all IC technologies such as substrate preparation, oxidation, diffusion and ion implantation. The course will focus on basic silicon processing. The students will be introduced to process modeling using a simulation tool such as SUPREM. The lab consists of conducting a basic metal gate PMOS process in the RIT clean room facility to fabricate and test a PMOS integrated circuit test ship. Laboratory work also provides an introduction to basic IC fabrication processes and safety. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3, Lecture 3 (Fall).

This is an advanced level course in Integrated Circuit Devices and process technology. A detailed study of processing modules in modern semiconductor fabrication sequences will be done through simulation. Device engineering challenges such as shallow-junction formation, fin FETs, ultra-thin gate dielectrics, and replacement metal gates are covered. Particular emphasis will be placed on non-equilibrium effects. Silvaco Athena and Atlas will be used extensively for process simulation. Graduate paper required. (Prerequisites: MCEE-601 or equivalent course.) Lab 2, Lecture 3 (Spring).

This course focuses on the deposition and etching of thin films of conductive and insulating materials for IC fabrication. A thorough overview of vacuum technology is presented to familiarize the student with the challenges of creating and operating in a controlled environment. Physical and Chemical Vapor Deposition (PVD & CVD) are discussed as methods of film deposition. Plasma etching and Chemical Mechanical Planarization (CMP) are studied as methods for selective removal of materials. Applications of these fundamental thin film processes to IC manufacturing are presented. Graduate paper required. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3, Lecture 2 (Fall).

Microlithography Materials and Processes covers the chemical aspects of microlithography and resist processes. Fundamentals of polymer technology will be addressed and the chemistry of various resist platforms including novolac, styrene, and acrylate systems will be covered. Double patterning materials will also be studied. Topics include the principles of photoresist materials, including polymer synthesis, photochemistry, processing technologies and methods of process optimization. Also advanced lithographic techniques and materials, including multi-layer techniques for BARC, double patterning, TARC, and next generation materials and processes are applied to optical lithography. Graduate paper required. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Lab 3, Lecture 3 (Fall, Spring).

This course focuses on CMOS manufacturing. Topics include CMOS process technology, work in progress tracking, CMOS calculations, process technology, long channel and short channel MOSFET, isolation technologies, back-end processing and packaging. Associated is a lab for on-campus section (01) and a graduate paper/case study for distance learning section (90). The laboratory for this course is the student-run factory. Topics include Lot tracking, query processing, data collection, lot history, cycle time, turns, CPK and statistical process control, measuring factory performance, factory modeling and scheduling, cycle time management, cost of ownership, defect reduction and yield enhancement, reliability, process modeling and RIT's advanced CMOS process. Silicon wafers are processed through an entire CMOS process and tested. Students design unit processes and integrate them into a complete process. Students evaluate the process steps with calculations, simulations and lot history, and test completed devices. (Prerequisites: MCEE-601 or equivalent course.) Lecture 8 (Spring).

Weekly seminar series intended to present the state of the art in microelectronics research. Other research-related topics will be presented such as library search techniques, contemporary issues, ethics, patent considerations, small business opportunities, technical writing, technical reviews, effective presentations, etc. (Prerequisites: Graduate standing in the MCEE-MS or MCEMANU-ME program or permission of instructor.) Seminar 1 (Fall, Spring).

A senior or graduate level course on the application of simulation tools for physical design and verification of the operation of semiconductor devices. The goal of the course is to provide a more in-depth understanding of device physics through the use of simulation tools. Technology CAD tools include Silvaco (Athena/Atlas) for device simulation. The lecture will explore the various models that are used for device simulation, emphasizing the importance of complex interactions and 2-D effects as devices are scaled deep-submicron. Laboratory work involves the simulation of various device structures. Investigations will explore how changes in the device structure can influence device operation. (This course requires permission of the Instructor to enroll.) Lab 3, Lecture 3 (Fall).

This course number is used to fulfill the graduate project requirement under the non-thesis option for the MS degree in Microelectronic Engineering. During this course, the student will be required to perform a literature survey, and conduct a limited scope investigation. Appropriate topics for this project may include: (i) development/characterization/documentation of semiconductor fabrication processes, (ii) characterization/measurement/documentation of semiconductor devices, or (iii) detailed simulation/design/documentation of semiconductor devices or processes. Alternative topics may be pursued with approval of the faculty advisor. The student must obtain the approval of an appropriate faculty member to supervise the paper before registering for this course. (This course is restricted to MCEE-MS Major students.) Project 3 (Fall, Spring, Summer).

The master's thesis in microelectronic engineering requires the student to prepare a written thesis proposal for approval by the faculty; select a thesis topic, adviser and committee; present and defend thesis before a thesis committee; prepare a written paper in a short format suitable for submission for publication in a journal. (Enrollment in this course requires permission from the department offering the course.) Thesis (Fall, Spring).